What is Silicon (Si) Sputtering Targets, Undoped?

Silicon (Si) sputtering targets are high-purity silicon materials used in thin film deposition and semiconductor applications. These targets are typically undoped, meaning they do not contain intentional impurities or dopants, ensuring high-purity film deposition.

Chemical Properties and CAS Number

• Material: Silicon (Si), Undoped
• CAS Number: 7440-21-3
• Purity: 99.999% (5N) to 99.9999% (6N)
• Appearance: Gray metallic solid
• Density: 2.33 g/cm³
• Melting Point: 1414°C
• Resistivity: >10 Ω·cm (for undoped silicon)
• Form: Circular or rectangular sputtering targets

Applications of Silicon (Si) Sputtering Targets

1. Semiconductor and Microelectronics

Used in the fabrication of microchips, integrated circuits (ICs), and transistors for high-performance computing devices.

2. Thin-Film Solar Cells

Applied as a base material for photovoltaic (PV) cells to enhance efficiency and energy conversion.

3. Optical Coatings

Utilized in anti-reflective and infrared coatings for optical devices, cameras, and sensors.

4. Data Storage Devices

Supports thin-film deposition in hard disk drives and magnetic storage applications.

5. MEMS (Micro-Electro-Mechanical Systems)

Essential in microfabrication techniques for sensors, actuators, and nano-devices.

Pricing of Silicon (Si) Sputtering Targets

Pricing depends on purity, dimensions, and order volume:

• Standard Purity (5N, 99.999%): Typically $100 – $500 per piece
• Ultra-High Purity (6N, 99.9999%): Ranges from $500 – $1,500 per piece
• Custom Sizes and Bulk Orders: Prices vary based on specifications and supplier terms

Factors Influencing Pricing

• Purity level (5N vs. 6N silicon)
• Target dimensions and thickness
• Customization (doping, alloying options)
• Market demand in semiconductor and solar industries

Conclusion

Silicon (Si) Sputtering Targets are critical in the semiconductor, photovoltaic, and optical industries, ensuring high-quality thin-film deposition for advanced applications.