What is Tungsten (W) Sputtering Targets?

Tungsten (W) sputtering targets are high-purity tungsten materials used for thin-film deposition in semiconductor, microelectronics, and optical applications. Due to tungsten’s high melting point, density, and conductivity, it is widely used in high-performance coating applications.

Chemical Properties and CAS Number

• Material: Tungsten (W)
• CAS Number: 7440-33-7
• Purity: 99.95% (3N5) to 99.999% (5N)
• Appearance: Silver-gray metallic solid
• Density: 19.25 g/cm³
• Melting Point: 3,422°C
• Thermal Conductivity: 173 W/m·K
• Form: Circular, rectangular, or custom-shaped sputtering targets

Applications of Tungsten (W) Sputtering Targets

1. Semiconductor and Microelectronics

Used in integrated circuits (ICs), transistors, and advanced semiconductor devices for enhanced electrical performance.

2. Thin-Film Solar Cells

Serves as a conductive back contact layer in photovoltaic cells to improve efficiency and durability.

3. Optical and Wear-Resistant Coatings

Applied in optical mirrors, anti-reflective coatings, and high-temperature protective layers.

4. Flat Panel Displays (FPDs) and OLEDs

Used in the production of thin-film coatings for display panels and organic light-emitting diodes (OLEDs).

5. Aerospace and Defense Applications

Utilized in high-temperature-resistant coatings for aerospace components and thermal barrier coatings.

Pricing of Tungsten (W) Sputtering Targets

Pricing depends on purity, dimensions, and order volume:

• Standard Purity (3N5, 99.95%): Typically $200 – $800 per piece
• High-Purity (5N, 99.999%): Ranges from $800 – $2,500 per piece
• Custom Sizes and Bulk Orders: Prices vary based on customization and supplier agreements

Factors Influencing Pricing

• Purity level (3N5 vs. 5N tungsten)
• Target thickness and diameter
• Customization options
• Market demand in semiconductor and aerospace industries

Conclusion

Tungsten (W) Sputtering Targets are essential for high-performance coatings in semiconductors, optical applications, and aerospace, ensuring durability and efficiency in thin-film deposition.