What is Magnesium Oxide (MgO) Sputtering Target?

Magnesium Oxide (MgO) sputtering targets are ceramic targets composed of high-purity MgO, used in thin-film deposition techniques such as physical vapor deposition (PVD) and magnetron sputtering. These targets offer excellent insulation, thermal stability, and high dielectric strength, making them ideal for electronic, optical, and protective coatings.

Chemical Properties and CAS Number

• Chemical Formula: MgO
• CAS Number: 1309-48-4
• Molecular Weight: 40.30 g/mol
• Density: 3.58 g/cm³
• Melting Point: 2,800°C
• Boiling Point: 3,600°C
• Appearance: White or off-white ceramic solid
• Purity: 99.5% – 99.999% (5N)

Applications of Magnesium Oxide (MgO) Sputtering Targets

1. Semiconductors & Microelectronics

Used as a buffer layer or dielectric material in semiconductor devices and high-frequency electronics.

2. Optical Coatings

MgO thin films are applied to optical lenses and mirrors to enhance reflection, refraction, and durability.

3. Protective Coatings

Used in displays, solar panels, and sensor technologies to provide scratch resistance and thermal stability.

4. Magnetic Storage Devices

Employed in magnetic tunnel junctions (MTJs) and spintronic devices for data storage applications.

5. Transparent Conductive Films

Serves as an insulating layer or diffusion barrier in multilayer display and photovoltaic structures.

6. Plasma Display Panels (PDPs)

Commonly used in dielectric layers to improve display performance and lifespan.

Pricing of MgO Sputtering Targets

• Laboratory-Scale (small discs): $100 – $500 USD per piece
• Industrial-Scale (large/custom targets): $1,000 – $5,000 USD per unit
• Custom Orders: Pricing depends on purity, dimensions, backing plate, and machining specs

Factors Influencing Price

• Target dimensions (diameter, thickness)
• Purity level (3N to 5N)
• Backing plate material (if applicable)
• Quantity ordered
• Surface finish and polishing grade
• Custom fabrication requirements