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What are Iron (Fe) Sputtering Targets?
Iron (Fe) Sputtering Targets are high-purity iron materials used in thin-film deposition techniques, such as Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). They are widely applied in electronics, magnetic storage devices, optical coatings, and advanced research applications.
Chemical Properties and CAS Number
- Chemical Formula: Fe
- CAS Number: 7439-89-6
- Molecular Weight: 55.85 g/mol
- Density: 7.87 g/cm³
- Melting Point: 1,538°C
- Boiling Point: 2,862°C
- Appearance: Grayish metallic solid
- Electrical Resistivity: 96.1 nΩ·m (at 20°C)
- Thermal Conductivity: 80.4 W/(m·K)
Applications of Iron (Fe) Sputtering Targets
1. Electronics & Semiconductor Industry
- Used in magnetic thin films for data storage and sensors.
- Enhances electrical conductivity in integrated circuits (ICs) and MEMS devices.
2. Optical Coatings
- Applied in anti-reflective coatings, infrared (IR) reflectors, and optical lenses.
- Used for advanced nanophotonic structures.
3. Magnetic Storage Devices
- Essential in hard drives, magnetic tapes, and spintronics.
- Enhances read/write efficiency in high-density data storage.
4. Aerospace & Defense Applications
- Used in high-performance coatings for satellite and space technology.
- Improves thermal and electromagnetic shielding properties.
5. Advanced Research & Nanotechnology
- Applied in thin-film transistors (TFTs) and superconducting materials.
- Supports catalysis and chemical sensor development.
Pricing of Iron (Fe) Sputtering Targets
- Lab-scale orders: $50 – $500 per piece
- Industrial-scale orders: $1,000 – $5,000 per batch
- Customized specifications: Prices vary based on purity and dimensions
Factors Affecting Pricing
- Purity level (99.5% – 99.999%)
- Sputtering target dimensions and shape
- Bulk order discounts
- Custom machining and specifications
- Packaging and shipping costs
Conclusion
Iron (Fe) Sputtering Targets play a vital role in electronics, magnetic storage, optical coatings, and aerospace applications. Their high thermal and electrical conductivity makes them an essential material in thin-film deposition processes.