What is Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz?

Silicon Dioxide (SiO2) Sputtering Targets, derived from fused quartz, are high-purity materials used in thin film deposition processes. These targets are commonly utilized in the semiconductor industry, optics, and protective coatings due to their excellent thermal stability, chemical resistance, and optical transparency.

Chemical Properties and CAS Number

• Material: Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz
• CAS Number: 7631-86-9
• Molecular Formula: SiO2
• Molecular Weight: 60.08 g/mol
• Density: ~2.65 g/cm³
• Melting Point: ~1,710°C
• Dielectric Constant: ~3.9
• Refractive Index: 1.46
• Solubility: Insoluble in water, resistant to most acids

Applications of Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz

1. Semiconductor and Electronics

Used in integrated circuits, insulating layers, and thin-film transistors to enhance performance and durability.

2. Optical Coatings

Utilized in anti-reflective coatings, UV protection, and laser optics for high-performance optical systems.

3. Protective Coatings and Display Technologies

Applied in screen protection for smartphones, tablets, and high-end displays to improve scratch resistance and durability.

4. Energy Applications

Used in solar cells, energy storage devices, and thin-film photovoltaic coatings to optimize efficiency.

5. Biomedical and Research Applications

Employed in biocompatible coatings, biosensors, and nanotechnology research due to its non-reactive nature.

Pricing of Silicon Dioxide (SiO2) Sputtering Targets, Fused Quartz

Pricing varies depending on purity, thickness, and customization:

• Small Lab-Scale Orders: $50 – $300 per unit
• Industrial-Scale Orders: $500 – $2,500 per unit
• Custom Configurations: Prices depend on purity, size, and specific coating requirements.

Factors Influencing Pricing

• Purity and compositional quality
• Manufacturing method (CVD, PVD, or sintering)
• Thickness and size of the target
• Supplier location and bulk discounts

Conclusion

Silicon Dioxide (SiO2) Sputtering Targets, derived from fused quartz, are essential materials in semiconductor, optics, and protective coatings applications. Their high thermal stability, durability, and chemical resistance make them a preferred choice for thin-film deposition and electronic device manufacturing.