What is Silicon (Si) Sputtering Targets, P-type?

Silicon (Si) sputtering targets, P-type, are high-purity silicon materials used in thin-film deposition processes, particularly in semiconductor and photovoltaic applications. These targets are doped with elements such as boron to create P-type conductivity, making them essential for electronic and optoelectronic devices.

Chemical Properties and CAS Number

• Material: Silicon (Si) Sputtering Targets, P-type
• CAS Number: 7440-21-3
• Purity: 99.99% – 99.9999%
• Doping Element: Boron (B)
• Crystal Orientation: (100), (110), (111)
• Density: 2.33 g/cm³
• Melting Point: 1414°C
• Resistivity: Customizable based on doping level

Applications of Silicon (Si) Sputtering Targets, P-type

1. Semiconductor Industry

Used in microelectronics, IC chips, and MOSFET fabrication.

2. Solar Cells and Photovoltaics

Essential for the production of P-type silicon thin films in solar panel manufacturing.

3. Thin Film Transistors (TFTs)

Applied in display technologies like LCDs and OLEDs.

4. Optoelectronics

Used in sensors, detectors, and laser diode applications.

5. MEMS and NEMS Devices

Utilized in micro-electromechanical and nano-electromechanical systems.

Pricing of Silicon (Si) Sputtering Targets, P-type

Pricing depends on purity, size, and supplier:

• Small Lab-Scale Targets (High Purity): $200 – $1,000 per piece
• Bulk Industrial Orders: $2,000 – $10,000 per set
• Custom Specifications: Prices vary based on size, thickness, and doping level

Factors Influencing Pricing

• Purity level (99.99% – 99.9999%)
• Doping concentration and resistivity range
• Crystal orientation and size specifications
• Supplier and market demand

Conclusion

Silicon (Si) Sputtering Targets, P-type, play a crucial role in semiconductor and photovoltaic industries. Their controlled doping and high purity make them an essential component for various electronic and optoelectronic applications.